<![CDATA[MRSEC Seminar Series - Structure and Composition of the 4H-SiC Surface and Dielectric Interface with Professor Leonard Feldman of the Institute for Advanced Materials, Devices and Nanotechnology at Rutgers University]]>

278081 event 1392990938 1492118587 <![CDATA[MRSEC Seminar Series - Structure and Composition of the 4H-SiC Surface and Dielectric Interface with Professor Leonard Feldman of the Institute for Advanced Materials, Devices and Nanotechnology at Rutgers University]]> Abstract: The 4H polytype of silicon carbide (SiC) is a promising candidate for high temperature and high power metal-‐oxide-‐semiconductor device applications. It is also used in the formation of graphene on SiC. In such applications high quality surfaces and interfaces are critical. For power MOSFETs the limit to application has been the dielectric/SiC interface which gives rise to a low inversion layer mobility. This is in sharp contrast to Si/SiO2 interfaces. This talk will describe the work of our team (see below) in characterizing and modifying the interface to raise the mobility by a factor of ~100 in the last 10 years. The current mobility values, although adequate for commercial devices, remain below expectation and require further research.

Biography: Leonard C. Feldman is Director of the Institute for Advanced Materials, Devices and Nanotechnology at Rutgers University. He also holds academic positions as Professor of Physics and Materials Science and Engineering at Rutgers, and is Emeritus at Vanderbilt University. Feldman received his PhD in Physics in 1967 from Rutgers University. He then served as a Member of Staff at Bell Labs from 1967-1996, his last position as Head of the Silicon Materials Research Department which carried on early research in the applications of oxy-nitrides, interfaces and Ge/Si structures.

Professor Feldman is a Fellow of the American Physical Society, the American Vacuum Society and the American Association for the Advancement of Science and a Sr. Member of IEEE. In 1999 he was awarded the 1999 David Adler Prize of the APS for research in materials physics.

Co-workers: Auburn University-J. Williams, S. Dhar; Rutgers MEIS Group-T. Gustafsson, Can Xu, S. Shubeita, H. Lee; Rutgers Chemistry-E. Garfunkel, Yi Xu

]]> 278071 image <![CDATA[Leonard Feldman - Rutgers]]> 198833 image/jpeg Email: info@ien.gatech.edu

Phone: 404.894.5100

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