{"328291":{"#nid":"328291","#data":{"type":"event","title":"IEN Technical Seminar on Advanced Fabrication: Introduction of Ushio Advanced Lithography Equipment at IEN.","body":[{"value":"\u003Ch3\u003E\u003Cstrong\u003EIntroduction of Ushio Advanced Lithography Equipment at IEN\u003C\/strong\u003E\u003C\/h3\u003EMr. Ryuta Furuya , Research Engineer, USHIO Inc. \u003Cbr \/\u003EThursday, October 2nd 2014, 12:00PM - 1:00PM \u003Cbr \/\u003EMarcus Nanotechnology Building: Room 1117\u20141118\u003Cp\u003E\u003Cstrong\u003EAbstract:\u003C\/strong\u003E Ushio\u2019s Projection Mask Aligner UX-44101, engineered for the manufacturing of MEMS devices, is available for use by faculty and\u0026nbsp; students users at the Institute for Electronics and Nanotechnology. The lithographic tool was installed in the Packaging Research Center\u2019s laboratory last year, and will be available until May of 2015.\u003C\/p\u003E\u003Cp\u003EThe UX-44101 has a minimum exposure area of 100 mm diameter, with the maximum capability to visualize the entire area of a 4\u201d wafer with one exposure. Within the 80 mm x 60mm area range, 2\u00b5m L\/S of resolution is achievable using samples prepared with a thin photoresist. The depth of focus for the UX-44101 is +\/- 10 \u00b5m. The UX-44101\u2019s large depth of focus is highly useful for 3D MEMS structure visualization and device manipulation.\u003C\/p\u003E\u003Cp\u003EThe UX-44101 has a dedicated operator in the Packaging Research Center laboratory who will operate the tool for users who have had no prior instruction in the use of mask aligners or characterization tools.\u003C\/p\u003E\u003Cp\u003E\u003Cstrong\u003EBio:\u003C\/strong\u003E \u0026nbsp;Ryuta Furuya received B.S. and M.S. degree of Physics from University of Tokyo, Tokyo, Japan in 2010 and 2012 respectively. He joined USHIO.Inc at 2012 as a research engineer. He is currently working at Georgia Institute of Technology\u0026nbsp; 3-D Packaging Research Center (GT-PRC). His recent research is development of panel base process for 2.5-D glass\/organic interposer. His current interests include projection lithography optics and MEMS packaging.\u003C\/p\u003E","summary":null,"format":"limited_html"}],"field_subtitle":"","field_summary":"","field_summary_sentence":[{"value":"Ushio\u2019s Projection Mask Aligner UX-44101, engineered for the manufacturing of MEMS devices, is available for use by faculty and  students users at the Institute for Electronics and Nanotechnology."}],"uid":"27863","created_gmt":"2014-09-24 14:06:11","changed_gmt":"2017-04-13 21:21:36","author":"Christa Ernst","boilerplate_text":"","field_publication":"","field_article_url":"","field_event_time":{"event_time_start":"2014-10-02T13:00:00-04:00","event_time_end":"2014-10-02T14:00:00-04:00","event_time_end_last":"2014-10-02T14:00:00-04:00","gmt_time_start":"2014-10-02 17:00:00","gmt_time_end":"2014-10-02 18:00:00","gmt_time_end_last":"2014-10-02 18:00:00","rrule":null,"timezone":"America\/New_York"},"extras":["free_food"],"hg_media":{"328281":{"id":"328281","type":"image","title":"Projection Mask Aligner UX-44101","body":null,"created":"1449245064","gmt_created":"2015-12-04 16:04:24","changed":"1475895039","gmt_changed":"2016-10-08 02:50:39","alt":"Projection Mask Aligner UX-44101","file":{"fid":"201821","name":"ushio_tool_lith.png","image_path":"\/sites\/default\/files\/images\/ushio_tool_lith.png","image_full_path":"http:\/\/www.tlwarc.hg.gatech.edu\/\/sites\/default\/files\/images\/ushio_tool_lith.png","mime":"image\/png","size":2679144,"path_740":"http:\/\/www.tlwarc.hg.gatech.edu\/sites\/default\/files\/styles\/740xx_scale\/public\/images\/ushio_tool_lith.png?itok=w-a-df0B"}}},"media_ids":["328281"],"groups":[{"id":"1271","name":"NanoTECH"},{"id":"197261","name":"Institute for Electronics and Nanotechnology"},{"id":"198081","name":"Georgia Electronic Design Center (GEDC)"},{"id":"213771","name":"The Center for MEMS and Microsystems Technologies"},{"id":"213791","name":"3D Systems Packaging Research Center"}],"categories":[],"keywords":[{"id":"91891","name":"cleanroom training"},{"id":"12701","name":"Institute for Electronics and Nanotechnology"},{"id":"104351","name":"MEMS fabrication"},{"id":"2285","name":"nanolithography"}],"core_research_areas":[],"news_room_topics":[],"event_categories":[{"id":"1795","name":"Seminar\/Lecture\/Colloquium"}],"invited_audience":[{"id":"78751","name":"Undergraduate students"},{"id":"78761","name":"Faculty\/Staff"},{"id":"78771","name":"Public"},{"id":"174045","name":"Graduate students"}],"affiliations":[],"classification":[],"areas_of_expertise":[],"news_and_recent_appearances":[],"phone":[],"contact":[{"value":"\u003Cp\u003EHang Chen: \u003Ca href=\u0022mailto:hang.chen@ien.gatech.edu\u0022\u003Ehang.chen@ien.gatech.edu\u003C\/a\u003E\u003C\/p\u003E","format":"limited_html"}],"email":[],"slides":[],"orientation":[],"userdata":""}}}