{"604946":{"#nid":"604946","#data":{"type":"event","title":"ELECTRON BEAM LITHOGRAPHY SEMINAR WITH ELIONIX","body":[{"value":"\u003Cp\u003E\u003Cstrong\u003ENEW TECHNOLOGY CAPABILITY ANNOUNCEMENT\u003Cbr \/\u003E\r\nElionix ELS-G100 Electron Beam Lithography System\u003C\/strong\u003E\u003Cbr \/\u003E\r\nFriday, April 20, 2018 | 12pm - 1pm | Marcus Nanotech 1117-1118\u003C\/p\u003E\r\n\r\n\u003Cp\u003EThis seminar will highlight the newly installed Elionix ELS-G100 Electron Beam Lithography System to the Marcus Inorganic Cleanroom. Attendees will receive a general introduction to e-beam lithography, i.e. direct-writing of user-defined CAD patterns with a beam of high-energy electrons. Additionally, the speaker will walk you through some of the advanced e-beamlithographytopics by using Elionix ELS-G100 as a model system.\u003C\/p\u003E\r\n\r\n\u003Cp\u003E\u003Cstrong\u003ESeminar Topics\u003C\/strong\u003E\u003C\/p\u003E\r\n\r\n\u003Cul\u003E\r\n\t\u003Cli\u003EE-beam system configuration and its components\u003C\/li\u003E\r\n\t\u003Cli\u003EPrinciples of operation for ebeam exposure\u003C\/li\u003E\r\n\t\u003Cli\u003ELimits of e-beam and its implications\u003C\/li\u003E\r\n\t\u003Cli\u003EProximity effect in ebeam exposure\u003C\/li\u003E\r\n\t\u003Cli\u003E\u0026nbsp;Effect of post-exposure processing\u003C\/li\u003E\r\n\u003C\/ul\u003E\r\n\r\n\u003Cp\u003E\u003Cstrong\u003ETool Specifications\u003C\/strong\u003E\u003C\/p\u003E\r\n\r\n\u003Cul\u003E\r\n\t\u003Cli\u003EGenerates patterns with a line width of 6nm with an 8\u0026rdquo; stage\u003C\/li\u003E\r\n\t\u003Cli\u003EStable 1.8nm electron beam using high beam current at 100kV\u003C\/li\u003E\r\n\t\u003Cli\u003E20bit DAC provides high beam positioning resolution\u003C\/li\u003E\r\n\t\u003Cli\u003EAt a beam current of 1nA, 20nm lines can be written over an entire\u003C\/li\u003E\r\n\t\u003Cli\u003E500\u0026mu;m field without stitching\u003C\/li\u003E\r\n\u003C\/ul\u003E\r\n\r\n\u003Cp\u003E\u003Cstrong\u003ESpeaker: Yong Sun\u003C\/strong\u003E - A dedicated and driven scientist by training, with 15 years of hands-on nanofabrication experience in the semiconductor field, Yong has worked\u003Cbr \/\u003E\r\nboth in academia and in industry, with research interests spanning across a varietyof subjects, including sensors, microfluidics, metamaterials, Li-Ion battery and energy\u003Cbr \/\u003E\r\nconverters, to name a few. I am currently the Product Manager at SEMTech Solutions, collaborating with a group of dedicated engineers to advance the Elionix e-beam technology. Before joining the Elionix team, I have worked as a cleanroom manager at Princeton University, teaching users on the operation of many lithography tools,including Elionix ELS-F125.\u003C\/p\u003E\r\n","summary":null,"format":"limited_html"}],"field_subtitle":"","field_summary":"","field_summary_sentence":[{"value":"This seminar will highlight the newly installed Elionix ELS-G100 Electron Beam Lithography System to the Marcus Inorganic Cleanroom."}],"uid":"27863","created_gmt":"2018-04-11 14:39:02","changed_gmt":"2018-04-11 14:43:26","author":"Christa Ernst","boilerplate_text":"","field_publication":"","field_article_url":"","field_event_time":{"event_time_start":"2018-04-20T13:00:00-04:00","event_time_end":"2018-04-20T14:00:00-04:00","event_time_end_last":"2018-04-20T14:00:00-04:00","gmt_time_start":"2018-04-20 17:00:00","gmt_time_end":"2018-04-20 18:00:00","gmt_time_end_last":"2018-04-20 18:00:00","rrule":null,"timezone":"America\/New_York"},"extras":["free_food"],"groups":[{"id":"213791","name":"3D Systems Packaging Research Center"},{"id":"198081","name":"Georgia Electronic Design Center (GEDC)"},{"id":"197261","name":"Institute for Electronics and Nanotechnology"},{"id":"1271","name":"NanoTECH"},{"id":"213771","name":"The Center for MEMS and Microsystems Technologies"}],"categories":[],"keywords":[{"id":"166968","name":"the Institute for Electronics and Nanotechnology"},{"id":"176189","name":"Integrated 3D Systems Group; Center for Co-design of Chip"},{"id":"2285","name":"nanolithography"},{"id":"177662","name":"E-Beam lihography"},{"id":"173609","name":"cleanroom techniques"},{"id":"91891","name":"cleanroom training"},{"id":"7553","name":"CAD"}],"core_research_areas":[],"news_room_topics":[],"event_categories":[{"id":"10377","name":"Career\/Professional development"},{"id":"1795","name":"Seminar\/Lecture\/Colloquium"}],"invited_audience":[{"id":"78761","name":"Faculty\/Staff"},{"id":"78771","name":"Public"},{"id":"174045","name":"Graduate students"},{"id":"78751","name":"Undergraduate students"}],"affiliations":[],"classification":[],"areas_of_expertise":[],"news_and_recent_appearances":[],"phone":[],"contact":[{"value":"\u003Cp\u003EDevin Brown | E-Beam Support Lead, Senior Research Engineer\u003Cbr \/\u003E\r\ndevin.brown@ien.gatech.edu\u003C\/p\u003E\r\n","format":"limited_html"}],"email":[],"slides":[],"orientation":[],"userdata":""}}}