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  <title><![CDATA[MSE Ph.D. Proposal - Stan Davis]]></title>
  <body><![CDATA[<p>Title: Study of the
Stress Relaxation Mechanisms Enabling Shape Preserving Silica Magnesiothermic
Reduction </p><p>Shape preserving
silica magnesiothermic reduction makes use of gas-silica displacement chemistry
to convert intricately shaped, hierarchically ordered, three-dimensional silica
structures into porous silicon replicas while maintaining complex features of
the starting silica template down to ~15 nm.&nbsp; This technique has been used
to convert a number of starting silica templates into porous silicon replicas
including diatom frustules, inverse opals, nanospheres, micropatterned
structures, etc., which exhibit enhanced surface area and porosity due to the
nature of the silicon conversion chemistry.&nbsp; </p>

<p>Despite the
progress made in applying silica magnesiothermic reduction to a wide range of
silica templates, understanding of the mechanisms enabling shape preservation
is still poor.&nbsp; In particular, large compressive stresses (~2-5 GPa) are
evolved in the products of silica magnesiothermic reduction due to large
changes in molar volume upon reaction (~20-60% depending upon silica
polymorph/crystallinity).&nbsp; Despite these stresses, geometric distortion
between the silica templates and porous silicon replicas is only very
modest.&nbsp; This implies that a stress relaxation mechanism operates
concurrently with the reaction, which enables the process to be shape
preserving.&nbsp; This investigation hopes to gain a better understanding of
the nature of this stress relaxation mechanism.&nbsp; Silica wafers will be
magnesiothermically treated to produce thin product films on the surface which
will be characterized using XRD (sin2ψ method)
to quantify the compressive stress evolved in these product films.&nbsp; Annealing
treatments at the reaction temperature will then be applied to induce stress
relief in the product films.&nbsp; Microstructural changes in the product films
will then be characterized to discern correlations between the microstructural
evolution of the product films and the rate of stress relief during annealing,
revealing the nature of the stress relaxation mechanism operating during silica
magnesiothermic reduction.&nbsp; It is hoped that this work will provide a
better understanding of the silica magnesiothermic reduction process which can
be used to attain better replication of starting silica templates as the
complexity of these templates increases.</p>]]></body>
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      <value><![CDATA[MSE Ph.D. Proposal - Stan Davis]]></value>
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      <value><![CDATA[<p>MSE Ph.D. Proposal
- Stan Davis </p>



<p>Title: Study of the
Stress Relaxation Mechanisms Enabling Shape Preserving Silica Magnesiothermic
Reduction </p>]]></value>
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      <value><![CDATA[2011-01-28T14:00:00-05:00]]></value>
      <value2><![CDATA[2011-01-28T17:00:00-05:00]]></value2>
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      <timezone><![CDATA[America/New_York]]></timezone>
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      <value><![CDATA[<p><a href="mailto:stan.davis@gatech.edu">stan.davis@gatech.edu</a></p>]]></value>
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          <item><![CDATA[School of Materials Science and Engineering]]></item>
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        <value><![CDATA[MSE_Interal_Event]]></value>
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