{"87221":{"#nid":"87221","#data":{"type":"news","title":"Dr. Perry writes Perspective for \u0022Science\u0022  on Optical Nanolithography","body":[{"value":"\u003Cp\u003EProf. Joseph Perry was invited to write a Perspective piece for Science on three reports in the area of optical nanolithography appearing in the May 15, 2009 issue.  These three articles describe approaches to optical lithography using longer excitation wavelengths, that offers potential for lower cost nanoltihgraphy, than the standard 193 nm used in industry to produce 45 nm features. \n\u003C\/p\u003E\n\u003Cp\u003EThe three works used related approaches to confine the exposure patterns in lithography.  Two of the papers use of a combination of photoactivation of the chemical reactions in the photoresist and, with a shaped beam that forms a ring around the photoactivating beam, photodeactivation such that the width of the patterned region is substantially narrowed.  The other paper uses a photochromic film in contact with a photoresist and narrows the excitation pattern in the resist by controlling the transmission profile in the photochromic film using two pumping wavelengths with properly shaped patterns. The articles report feature sizes in the range of 10\u0027s of nm.\n\u003C\/p\u003E\n\u003Cp\u003EThe Perry group has previously reported on nanolithography with a resolution of 65 nm using multiphoton excitation of photoresists. (\u00e2\u0080\u009c65 nm Feature Sizes using Visible Wavelength 3-D Multiphoton Lithography,\u00e2\u0080\u009d W. Haske, V. W. Chen, J. M. Hales, W. Dong, S. Barlow, S. R. Marder, J. W. Perry, Opt. Express, 15 (6), 3426-3436 (2007).)\n\u003C\/p\u003E","summary":null,"format":"limited_html"}],"field_subtitle":[{"value":"Article appeared in May 15, 2009 issue."}],"field_summary":[{"value":"Prof. Joseph Perry was invited to write a Perspective piece for Science on three reports in the area of optical nanolithography appearing in the May 15, 2009 issue.  These three articles describe approaches to optical lithography using longer excitation wavelengths, that offers potential for lower cost nanolithography, than the standard 193 nm used in industry to produce 45 nm features.","format":"limited_html"}],"field_summary_sentence":[{"value":"Prof. Perry invited to write Perspective piece by magazine."}],"uid":"27275","created_gmt":"2009-06-08 00:00:00","changed_gmt":"2016-10-08 03:10:18","author":"Shirley Tomes","boilerplate_text":"","field_publication":"","field_article_url":"","dateline":{"date":"2009-06-08T00:00:00-04:00","iso_date":"2009-06-08T00:00:00-04:00","tz":"America\/New_York"},"extras":[],"related_links":[{"url":"http:\/\/www.sciencemag.org.www.library.gatech.edu:2048\/cgi\/content\/full\/324\/5929\/892","title":"Full text of article"}],"groups":[{"id":"85951","name":"School of Chemistry and Biochemistry"}],"categories":[{"id":"129","name":"Institute and Campus"},{"id":"141","name":"Chemistry and Chemical Engineering"},{"id":"134","name":"Student and Faculty"},{"id":"135","name":"Research"}],"keywords":[{"id":"167556","name":"Sigma Xi"}],"core_research_areas":[],"news_room_topics":[],"event_categories":[],"invited_audience":[],"affiliations":[],"classification":[],"areas_of_expertise":[],"news_and_recent_appearances":[],"phone":[],"contact":[{"value":"\u003Cstrong\u003EShirley Tomes\u003C\/strong\u003E\u003Cbr \/\u003EChemistry \u0026amp; Biochemistry\u003Cbr \/\u003E\u003Ca href=\u0022http:\/\/www.gatech.edu\/contact\/index.html?id=st81\u0022\u003EContact Shirley Tomes\u003C\/a\u003E\u003Cbr \/\u003E\u003Cstrong\u003E404-894-0591\u003C\/strong\u003E","format":"limited_html"}],"email":["shirley.tomes@chemistry.gatech.edu"],"slides":[],"orientation":[],"userdata":""}}}